Exogenesis Corporation products

NanoAccel’s platform technology employs a technology known as gas cluster ion beam (GCIB). Pressurized argon gas, used due to its inert properties, is expanded through a small nozzle into vacuum to form a beam of gas clusters. Each cluster is comprised of several hundred to a few thousand weakly bound atoms. The clusters are caused to become electrically charged and they are then accelerated by high potentials of up to several tens of thousands of volts.

Exogenesis has created a new NanoAccel technology known as accelerated neutral atom beam (ANAB). NanoAccell is used for ultra-shallow processing of surfaces used for biomedical applications, for optical components, for semiconductor devices, and for other nanosurface modified products. In ANAB, a beam of accelerated gas cluster ions is initially produced as described in GCIB, but the gas cluster is caused to dissociate and a deflector removes the charge.